JPS6129499Y2 - - Google Patents
Info
- Publication number
- JPS6129499Y2 JPS6129499Y2 JP461081U JP461081U JPS6129499Y2 JP S6129499 Y2 JPS6129499 Y2 JP S6129499Y2 JP 461081 U JP461081 U JP 461081U JP 461081 U JP461081 U JP 461081U JP S6129499 Y2 JPS6129499 Y2 JP S6129499Y2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- air introduction
- photoresist
- head
- spinner head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 24
- 238000005553 drilling Methods 0.000 claims 1
- 230000001737 promoting effect Effects 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 15
- 238000005530 etching Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP461081U JPS6129499Y2 (en]) | 1981-01-16 | 1981-01-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP461081U JPS6129499Y2 (en]) | 1981-01-16 | 1981-01-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57119774U JPS57119774U (en]) | 1982-07-24 |
| JPS6129499Y2 true JPS6129499Y2 (en]) | 1986-08-30 |
Family
ID=29803023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP461081U Expired JPS6129499Y2 (en]) | 1981-01-16 | 1981-01-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6129499Y2 (en]) |
-
1981
- 1981-01-16 JP JP461081U patent/JPS6129499Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57119774U (en]) | 1982-07-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH07169684A (ja) | レジスト堆積方法 | |
| US6569241B2 (en) | Substrate spinning apparatus | |
| JPS6129499Y2 (en]) | ||
| JPH0512990B2 (en]) | ||
| JP3280791B2 (ja) | 塗膜形成方法 | |
| JPS584926A (ja) | 回転塗布装置 | |
| JP2002299204A (ja) | スピンナー用治具、スピンナー及びスピン塗布方法 | |
| JPH08222502A (ja) | 回転塗布装置 | |
| JPH05259050A (ja) | 半導体基板のスピンコーティング方法および装置 | |
| JPH05109612A (ja) | レジスト塗布装置 | |
| JPH0732242B2 (ja) | 固体撮像装置の製造方法 | |
| JPH0521330A (ja) | フオトレジスト塗布方法 | |
| JPH0453224A (ja) | スピンコータ | |
| JPS581144A (ja) | フオトレジストの塗布方法 | |
| JP2541385B2 (ja) | 略密閉型スピンナとスピンコ―ト方法 | |
| JPS60189934A (ja) | 粘性液の塗布方法 | |
| JPH05259049A (ja) | 半導体基板のスピンコーティング方法 | |
| JPH05136039A (ja) | レジスト塗布装置および半導体装置の製造方法 | |
| JP2542508Y2 (ja) | スピンコーター装置 | |
| JPS5998766A (ja) | 回転塗布機 | |
| JPH0343728U (en]) | ||
| JP3459115B2 (ja) | 基板の回転塗布装置 | |
| JPH02133917A (ja) | レジストの塗布方法及びレジスト塗布装置 | |
| US20010023137A1 (en) | Substrate coating apparatus and semiconductor processing method of improving uniformity of liquid deposition | |
| JP2575959B2 (ja) | 回転塗布装置 |